Maskless UV lithography equipment for wafer-level 2D/2.5D
micro-nanostructure processing.
The equipment, requiring no masks, achieves nanoscale precision with minimal stitching errors. It employs a proprietary high-speed processing method, offering high direct writing speed and resolution. Featuring integrated design, full automation, and user-friendly operation, it accommodates substrates up to 12 inches, making it suitable for rapid prototyping, modeling, or small-batch production, facilitating industrial applications. Widely applied in microfluidics, semiconductors, biomedical engineering, and microelectronics.
- Higher alignment precision and uniformity
- Nanoscale motion accuracy and precise positioning
- Long-term stability control system
- Multiple processing modes available, allowing for quick upgrades and expanded services
- Automated visual control system
- Real-time imaging measurement system
- Automatic leveling and focusing of the processing surface
- Larger processing area, suitable for different-sized substrates
- Infinity field of writing to reduce stitching errors
- Compatible with various substrates, providing automated wafer chuck
For equipment parameters,please call0535-2981985、18615037996